Update of >300W high power LPP-EUV source challenge IV for semiconductor HVM
Autor: | Hakaru Mizoguchi, Hiroaki Tomuro, Yuichi Nishimura, Hirokazu Hosoda, Hiroaki Nakarai, Tamotsu Abe, Hiroshi Tanaka, Yukio Watanabe, Yutaka Shiraishi, Tatsuya Yanagiga, Georg Soumagne, Fumio Iwamoto, Shinji Nagai, Yoshifumi Ueno, Takashi Suganuma, Gouta Niimi, Takayuki Yabu, Tsuyoshi Yamada, Takashi Saitou |
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Rok vydání: | 2021 |
Zdroj: | International Conference on Extreme Ultraviolet Lithography 2021. |
DOI: | 10.1117/12.2600714 |
Databáze: | OpenAIRE |
Externí odkaz: |