Intercalation Doping with Metal Chlorides in Low-Temperature-Grown Multilayer CVD Graphene for Interconnect Applications

Autor:	M. Takahashi, Akihiro Kajita, Y. Yamazaki, Hisao Miyazaki, Kazuyoshi Ueno, Masayuki Katagiri, R. Matsumoto, Daisuke Nishide, T. Matsumoto, T. Sakai, Naoshi Sakuma, R. Ifuku
Rok vydání:	2015
Předmět:	Metal Interconnection Materials science visual_art Doping Intercalation (chemistry) visual_art.visual_art_medium Nanotechnology Cvd graphene
Zdroj:	Extended Abstracts of the 2015 International Conference on Solid State Devices and Materials.
DOI:	10.7567/ssdm.2015.e-1-5
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::85fa34600ee645dcdbb00a0108309af7 https://doi.org/10.7567/ssdm.2015.e-1-5 Zobrazit plný text záznamu