Optical Properties of a-C:H Films Deposited by Plasma Microwave Discharge with Controlling Substrate Temperature

Autor:	M. Kihel, Salah Sahli, Patrice Raynaud, Yvan Segui, Richard Clergereaux
Rok vydání:	2011
Předmět:	chemistry.chemical_compound Materials science Acetylene chemistry Band gap Plasma-enhanced chemical vapor deposition General Engineering Analytical chemistry Substrate (electronics) Plasma Thermophoresis Microwave Amorphous solid
Zdroj:	Advanced Materials Research. 227:200-203
ISSN:	1662-8985
DOI:	10.4028/www.scientific.net/amr.227.200
Popis:	Amorphous hydrogenated carbon (a-C:H) films have been deposited in Microwave Multipolar plasma reactor (MMP) using pure acetylene as precursor with controlling substrate temperature. Investigations on the optical properties of deposited films according to the substrate temperature have been reported. It has been observed that the optical band gap decreases and the Csp2 concentration increases when cooling down the substrate temperature. On the other hand, it has been revealed elsewhere that cooling down the substrate temperature during the deposition process, leads to the increase of particles trapped density in the deposited films due to a phenomenon of thermophoresis. Therefore, the optical properties evolution is linked to the increases of particles trapped density in the deposited films.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::85f779eaacc4eb1b4e3fd642b1c1472c https://doi.org/10.4028/www.scientific.net/amr.227.200 Zobrazit plný text záznamu