Etching Behavior of Undoped and Doped CdTe in Aqueous H2O2-HBr-Ethylene Glycol Mixtures
| Autor: | P. I. Feichuk, L. Shcherbak, Z. F. Tomashik, I. B. Stratiichuk, V. N. Tomashik |
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| Rok vydání: | 2005 |
| Předmět: |
Aqueous solution
Materials science General Chemical Engineering Kinetics Doping Metals and Alloys Mineralogy Polishing Cadmium telluride photovoltaics Inorganic Chemistry chemistry.chemical_compound Chemical engineering chemistry Etching (microfabrication) Materials Chemistry Dissolution Ethylene glycol |
| Zdroj: | Inorganic Materials. 41:673-679 |
| ISSN: | 1608-3172 0020-1685 |
| DOI: | 10.1007/s10789-005-0188-8 |
| Popis: | The mechanism and kinetics of undoped and doped CdTe dissolution in aqueous H2O2-HBr-ethylene glycol mixtures are investigated. The results are used to construct the dissolution rate-etchant composition diagrams for the materials studied and to identify the rate-limiting step of the dissolution process. Dissolution in polishing etchants is shown to be diffusion-limited. Doping has a significant effect on the dissolution behavior of CdTe. |
| Databáze: | OpenAIRE |
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