Double layer SiNx:H films for passivation and anti-reflection coating of c-Si solar cells
| Autor: | Jisoo Ko, Kong-Soo Lee, Junsin Yi, Kwang-Ryul Kim, Daeyeong Gong, Krishnakumar Pillai, Pyungho Choi, Byoungdeog Choi, Minkyu Ju |
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| Rok vydání: | 2011 |
| Předmět: |
Materials science
Passivation Metals and Alloys Analytical chemistry Surfaces and Interfaces Carrier lifetime Chemical vapor deposition engineering.material Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Surface coating Coating Plasma-enhanced chemical vapor deposition law Solar cell Materials Chemistry engineering Wafer |
| Zdroj: | Thin Solid Films. 519:6887-6891 |
| ISSN: | 0040-6090 |
| Popis: | In this report, we present a cost effective simple innovative approach to fabricate double layer anti-reflection (DLAR) coatings using a single material which can provide high qualities of passivation and anti-reflection property. Two layers of SiN x :H films with different refractive indices were deposited onto p-type c-Si wafer using plasma enhanced chemical vapor deposition reactor by controlling the NH 3 and SiH 4 gas ratio. Refractive indices of top and bottom layers were chosen as 1.9 and 2.3 respectively. The effect of passivation at the interface was investigated by effective carrier lifetime, hydrogen concentration and interface trapped density (D it ) measurements. The optical characteristic was analyzed by reflectance and transmittance measurements. A superior efficiency of 17.61% was obtained for solar cells fabricated with DLAR coating when compared to an efficiency of 17.24% for cells with SLAR coating. Further, J sc and V oc of solar cell with DLAR coating is increased by a value of ~ 1 mA/cm 2 and 4 mV respectively than cell with SLAR coating. |
| Databáze: | OpenAIRE |
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