Deposition and wear resistance of composite TiBC-SiC coatings on Si wafer by thermal plasma CVD

Autor:	Shiro Shimada, Isao Yamazaki, Jiro Tsujino, Yusuke Fuji, Hajime Kiyono
Rok vydání:	2009
Předmět:	Materials science Scanning electron microscope Composite number chemistry.chemical_element General Chemistry Condensed Matter Physics Microstructure chemistry Transmission electron microscopy Materials Chemistry Ceramics and Composites Wafer Thin film Composite material Boron Titanium
Zdroj:	Journal of the Ceramic Society of Japan. 117:415-420
ISSN:	1348-6535 1882-0743
DOI:	10.2109/jcersj2.117.415
Popis:	Composite TiBC-SiC film coatings with various contents of SiC were deposited on Si wafer at 800°C from a mixed solution of titanium tetra-ethoxide, boron tri-ethoxide and/or hexa-methyl-disiloxane by an Ar/H2 thermal plasma CVD. The crystalline phases (TiB2, TiC, SiC) in the coatings are identified by thin film grazing incidence X-ray diffraction. The surfaces and cross-sections of the monolithic TiBC and SiC and composite TiBC-SiC coatings are observed by scanning electron microscopy. The microstructure of a cross-section of composite TiBC-55 mol% SiC film is observed by transmission electron microscopy with EDX analysis. The wear rates of the composite TiBC-SiC film are evaluated from cross-sectional profiles of the residual wear tracks formed by ball-on-disk wear tests using SUS and alumina balls with their results correlated with the SiC content and film hardness.
Databáze:	OpenAIRE
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