| Autor: |
O.A. Fedorovich, V.N. Pavlenko, V.V. Ustalov |
| Rok vydání: |
2002 |
| Předmět: |
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| Zdroj: |
25th Anniversary, IEEE Conference Record - Abstracts. 1998 IEEE International Conference on Plasma Science (Cat. No.98CH36221). |
| DOI: |
10.1109/plasma.1998.677812 |
| Popis: |
Summary form only given, as follows. We have created a plasma chemical reactor with the operating axial-symmetric magnetic field. We have the possibility of checking in main working regime the energy of ions from 20 eV to 200 eV. The absence in a chemical active plasma of ions with energy >200 eV allows etching of different materials and thin films of micron and submicron sizes without defects. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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