Silicon solar cell performance deposited by diamond like carbon thin film 'Atomic oxygen effects'
| Autor: | Esmaeil Karami, Abbas Ali Aghaei, Akbar Eshaghi |
|---|---|
| Rok vydání: | 2017 |
| Předmět: |
inorganic chemicals
Materials science Silicon Nanocrystalline silicon Aerospace Engineering chemistry.chemical_element 02 engineering and technology Quantum dot solar cell engineering.material 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences Copper indium gallium selenide solar cells Polymer solar cell 0104 chemical sciences law.invention Polycrystalline silicon chemistry Chemical engineering law Solar cell engineering Thin film 0210 nano-technology |
| Zdroj: | Acta Astronautica. 138:369-373 |
| ISSN: | 0094-5765 |
| DOI: | 10.1016/j.actaastro.2017.06.016 |
| Popis: | In this research, a diamond-like carbon thin film was deposited on p-type polycrystalline silicon solar cell via plasma-enhanced chemical vapor deposition method by using methane and hydrogen gases. The effect of atomic oxygen on the functioning of silicon coated DLC thin film and silicon was investigated. Raman spectroscopy, field emission scanning electron microscopy, atomic force microscopy and attenuated total reflection–Fourier transform infrared spectroscopy were used to characterize the structure and morphology of the DLC thin film. Photocurrent–voltage characteristics of the silicon solar cell were carried out using a solar simulator. The results showed that atomic oxygen exposure induced the including oxidation, structural changes, cross-linking reactions and bond breaking of the DLC film; thus reducing the optical properties. The photocurrent–voltage characteristics showed that although the properties of the fabricated thin film were decreased after being exposed to destructive rays, when compared with solar cell without any coating, it could protect it in atomic oxygen condition enhancing solar cell efficiency up to 12%. Thus, it can be said that diamond-like carbon thin layer protect the solar cell against atomic oxygen exposure. |
| Databáze: | OpenAIRE |
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