Analysis and Improvement of Horizontal Line Mura

Autor: 周哲 Zhou Zhe
Rok vydání: 2012
Předmět:
Zdroj: Chinese Journal of Liquid Crystals and Displays. 27:649-652
ISSN: 1007-2780
DOI: 10.3788/yjyxs20122705.0649
Popis: Horizontal Line Mura is one kind of defect during TFT-LCD manufacturing process.This defect will affect display quality seriously.After analyzing the profile of the metal layer and measuring the stress status of metal film,the root cause can be revealed.It shows that during deposition process of metal film on glass substrate,the stress of Mo layer between the center area and glass edge is different,and this caused the loose of Mo layer,which affect the capacitor between gate and source electrode,then cause display voltage shifting on the pixel.To solve this issue,by removing bottom Mo layer to adjust Gate layer stack ratio,the failure rate can be effectively reduced.And this is demonstrated by experiment.
Databáze: OpenAIRE