Scribe Line Self Reference Targets to enable Accurate and Robust After-Etch Overlay Metrology of Active layer

Autor:	Jimmy Chang, Junjun Zhang, Wei Zhang, Panpan Wang, Xiaofang Zhou, Rui Qin, Silva Hu, Shaowen Qiu, Yunsheng Xia, Giacomo Miceli, Sylvia Yuan, Natalia Drabik, Pavel Izikson, Giulia Argento, Bas van der Broek, Elton Bitincka, Hao Jing, Shaun Dai, Yvon Chai, Yu Liu, Justin Jiang
Rok vydání:	2021
Zdroj:	2021 International Workshop on Advanced Patterning Solutions (IWAPS).
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::84ca15b372c501a3f175e5d143aa65e0 https://doi.org/10.1109/iwaps54037.2021.9671261 Zobrazit plný text záznamu