Ultra-High-Speed Crystallization of Amorphous Silicon Films on Flexible Glass Substrate by Thermal-Plasma-Jet Irradiation Using Cylindrical Rotation Stage

Autor:	S. Higashi, Wataru Nakano, H. Hanafusa
Rok vydání:	2018
Předmět:	Amorphous silicon Ultra high speed Materials science Substrate (electronics) Rotation law.invention chemistry.chemical_compound chemistry law Thermal Irradiation Stage (hydrology) Crystallization Composite material
Zdroj:	Extended Abstracts of the 2018 International Conference on Solid State Devices and Materials.
DOI:	10.7567/ssdm.2018.n-8-04
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::84c670018f58760f432e9336d7b7d5f8 https://doi.org/10.7567/ssdm.2018.n-8-04 Zobrazit plný text záznamu