Nanolithography using micro-scale mask enabled by hyperbolic metamaterial

Autor:	Donghwan Kim, Yong Rae Cho, Bumki Min
Rok vydání:	2015
Předmět:	Diffraction Materials science Optics Nanolithography Computer simulation Scale (ratio) business.industry Limit (music) Physics::Optics Metamaterial business
Zdroj:	2015 11th Conference on Lasers and Electro-Optics Pacific Rim (CLEO-PR).
Popis:	We newly developed a nano-scale patterning method overcoming the diffraction limit of conventional photo-lithography technique by utilizing micro-scale aluminum mask-hyperbolic metamaterials hybrid structures, which is supported by our numerical simulation and experimental results.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8494d7dd40c01ad2b37db3bffa95a3f5 https://doi.org/10.1109/cleopr.2015.7376518 Zobrazit plný text záznamu