Bistable memory and logic‐gate devices fabricated by intercrossed stacking of graphene–ferroelectric hybrid ribbons
| Autor: | In-Ku Kang, Woo Young Kim, Hyun Bin Shim, Gwang-Jae Jeon, Tae-Hyo Kim, Hee Chul Lee, Hyeon-Don Kim |
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| Rok vydání: | 2016 |
| Předmět: |
Materials science
Bistability business.industry Graphene Transistor Biomedical Engineering Stacking Bioengineering 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Ferroelectric capacitor law.invention law Logic gate 0103 physical sciences Optoelectronics General Materials Science Field-effect transistor 010306 general physics 0210 nano-technology business AND gate |
| Zdroj: | Micro & Nano Letters. 11:356-359 |
| ISSN: | 1750-0443 |
| Popis: | A ferroelectric-gated graphene field-effect transistor was fabricated by consecutively stacking two distinct graphene–ferroelectric hybrid ribbons at right angles. Two graphene layers play different roles. One graphene layer acts as a gate electrode and the other graphene layer acts as a channel between two electrodes, source and drain. Electric gating at the gate graphene modulates the resistance of the channel graphene. By means of ferroelectric polarisation, bistable resistance states of the channel graphene could be recorded, and the retention time of bistability was estimated to be 460 days by extrapolating of two resistance values in time–resistance relationships. Furthermore, the underlying concept to fabricate bistable memory device was extended to the methodology to realise a logic-gate device by stacking three distinct graphene–ferroelectric hybrid ribbons. |
| Databáze: | OpenAIRE |
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