Formation of inhomogeneous oxide and suboxide layers on an ultra-thin metal film by multiple oxidation and ion sputtering

Autor: null Pavlov O. N., null Iachuk V. A., null Lukiantsev D. S., null Pavolotsky A.B., null Lubenchenko O. I., null Ivanov D. A., null Lubenchenko A. V.
Rok vydání: 2022
Zdroj: Technical Physics. 92:990
ISSN: 1726-748X
DOI: 10.21883/tp.2022.08.54561.68-22
Popis: A technique of controlled formation of multilayer oxide and suboxide layers on a thin metal film. An opportunity of controlled generation of films containing an ultra-thin suboxide layer inside a higher oxide layer and films being a periodic layered structure with alternating oxide layers of various oxidation levels. A structure containing alternating ultra-thin layers of higher oxide and suboxide layers on a niobium film. Keywords: metal-oxide films, controlled film formation, layer chemical and phase profiling, X-ray photoelectron spectroscopy.
Databáze: OpenAIRE