Development of Lift-off Process using Plasma Enhanced Chemical Vapour Deposition Silicon dioxide

Autor:	Yatish Prasad Yatish Prasad, Chiranjeevi Lakavath Chiranjeevi Lakavath, H. M. Raghvendra H. M. Raghvendra, Selvaraj Selvaraj, B. Bhattacharyya B. Bhattacharyya, P. Sathish Kumar P. Sathish Kumar
Rok vydání:	2020
Zdroj:	Journal of Environmental Nanotechnology. 9:04-07
ISSN:	2319-5541 2279-0748
DOI:	10.13074/jent.2020.06.202406
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8419953e7de7fa3091455c3d3d03d4eb https://doi.org/10.13074/jent.2020.06.202406 Zobrazit plný text záznamu