On the mechanism of chemical diffusion in solids and its application to oxidation

Autor:	V. N. Bogoslovskii, N. M. Stafeeva, N. A. Balanaeva, V. I. Arkharov
Rok vydání:	1971
Předmět:	Chemistry Activated complex Kinetics Metals and Alloys Lattice diffusion coefficient Activation energy Limiting Crystal structure Crystallographic defect Inorganic Chemistry Chemical physics Lattice (order) Materials Chemistry Physical chemistry
Zdroj:	Oxidation of Metals. 3:251-259
ISSN:	1573-4889 0030-770X
DOI:	10.1007/bf00603525
Popis:	The participation of crystal lattice atoms in an elementary act of chemical diffusion may have a collective nature. This involves a consecutive elastic translation of activated complexes, the distorted regions possessing more mobility than an equivalent quantity of point defects. Thermodynamic analysis shows that participation of an activated complex occurs during chemical diffusion. This model is applied to the kinetics of the oxidation of metals. The apparent activation energy of the process is considerably lower in this case than in the case of self-diffusion in the lattice. It is shown that there exists a limiting thickness of the scale above which further growth occurs at the cost of point defect motion with a lower rate.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::84117d5d70ef972c2746f081d69944d2 https://doi.org/10.1007/bf00603525 Zobrazit plný text záznamu Full text from SpringerLink