CHEMICAL VAPOR DEPOSITION OF METAL BORIDES

Autor: James T. Spencer, Shreyas S. Kher
Rok vydání: 1998
Předmět:
Zdroj: Journal of Physics and Chemistry of Solids. 59:1343-1351
ISSN: 0022-3697
DOI: 10.1016/s0022-3697(97)00230-8
Popis: The chemical vapor deposition (CVD) of high quality polycrystalline thin films of lanthanum hexaboride, LaB 6 , was achieved through the vacuum copyrolysis of the boron hydride clusters, nido -pentaborane(9) [B 5 H 9 ] and nido -decaborane(14) [B 10 H 14 ], with lanthanum(III) chloride at 800–900°C. The reddish purple films adhered well to the deposition substrates explored (copper, quartz, Pyrex and ceramic materials). Deposition rates of approximately 1–2 μm/h were typically observed. The films were analyzed by scanning electron microscopy (SEM), X-ray emission spectroscopy (XES), X-ray diffraction (XRD), wavelength dispersive X-ray emission spectrometry (WDXES), and glow discharge mass spectrometry (GDMS). WDXES and GDMS data showed that the LaB 6 films were relatively uniform in composition in the bulk material. SEM data showed that the as-deposited materials were very highly crystalline. Films which consisted either partly or entirely of square rods of LaB 6 with either square or finely tapered tips could also be grown. Reflection high energy electron diffraction (RHEED) experiments confirmed the identity of the square rods as crystalline cubic LaB 6 .
Databáze: OpenAIRE