Production of extreme ultraviolet (EUV) quality silicon carbide (SiC) aspheric optics

Autor: Joseph L. Robichaud, Andrea Arneson, Jay Schwartz
Rok vydání: 2008
Předmět:
Zdroj: Advanced Optical and Mechanical Technologies in Telescopes and Instrumentation.
ISSN: 0277-786X
DOI: 10.1117/12.789731
Popis: L-3 Communications, SSG-Tinsley reports the optical performance demonstrated with an EUV quality aspheric mirror. The off axis ellipsoidal reflector demonstrates a surface figure of < 3 nm RMS and a surface finish which ranges from 3 - 7 Angstroms RMS depending on the spatial period of interest. Interferometric data is provided along with surface roughness results obtained with phase measuring microscopy. The capability to produce high quality SiC aspheric optics, combined with the inherent thermal stability associated with SiC, enables a number of advanced mission concepts, including next generation solar observing.
Databáze: OpenAIRE