Autor: |
R. Nasongkhla, J.G. Shanthikumar, R.K. Nurani, M. McIntyre |
Rok vydání: |
2002 |
Předmět: |
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Zdroj: |
IEEE/SEMI 1998 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop (Cat. No.98CH36168). |
DOI: |
10.1109/asmc.1998.731373 |
Popis: |
We describe the multivariate statistical process control approach which uses a weighted average metric as a metric plotted on a control chart. We show that the optimal weighted coefficient is a function of the mean-shift vector and covariance matrix of metrics of interest. The control chart constructed by this optimal weighted average metric will have the highest signal to noise ratio and the lowest /spl alpha/ and /spl beta/ errors. A numerical example using actual data from a fab is also provided. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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