High Refractive Index Fluid Evaluations at 193nm: Fluid Lifetime and Fluid/Resist Interaction Studies

Autor:	Hoang Vi Tran, Douglas J. Adelman, John J. Schmieg, Adams S. Bernfeld, Rebekah A. Derryberry, Eric Hendrickx, Mureo Kaku, Charles Y. Chen, Frieda Van Roey, Roger H. French, Michael T. Mocella, Nyrissa S. Rogado
Rok vydání:	2008
Předmět:	Materials science Polymers and Plastics business.industry High-refractive-index polymer Organic Chemistry Radiation Durability Contact angle Optics Resist Materials Chemistry Immersion (virtual reality) Composite material business Refractive index Immersion lithography
Zdroj:	Journal of Photopolymer Science and Technology. 21:631-639
ISSN:	1349-6336 0914-9244
Popis:	We report on recent studies on two of our leading fluid candidates for high index immersion lithography, designated IF132 and IF169. The most recent fluid radiation durability results are discussed, leading us to define two important parameters, the fluid lifetime factor and the clean window dose related to suppression of window contamination through use of active recycle technology. Results of fluid-resist interactions, with water and high index fluids on four commercial resists, will be shown. These experiments include PAG leaching and contact angle measurements, resist profile and thickness changes due to pre- and post-exposure fluid contact, residues and defects from the fluid and from resist contact, and 36 nm hp imaging on an immersion interference printer.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::830b1f7cc8ed8e6fb53e41d04fad0e80 https://doi.org/10.2494/photopolymer.21.631 Zobrazit plný text záznamu