Effects of reticle reflectance on lithography

Autor:	Eric Weisbrod, Pawitter J. S. Mangat, William J. Dauksher, Bernd Geh, Kevin J. Nordquist, James R. Wasson, Kevin Cummings, Bing Lu
Rok vydání:	2003
Předmět:	Image formation Materials science business.industry Reflectivity law.invention Optics law Reticle Image acquisition Optoelectronics Photomask business Lithography Flare
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.516925
Popis:	We report in this work experimental and theoretical results showing the effects of absorber reflectivity on standard flare measurements, image formation and how this may contribute to various image metrics used in lithography. Our study shows that under typical conditions the reflectance from the absorber film has only a small effect on the image produced by the exposure system.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::8305c65c5398c5079c26ae3cad37f233 https://doi.org/10.1117/12.516925 Zobrazit plný text záznamu