Magnetic Compton Profile Measurement of Thin Films

Autor: Hiroshi Sakurai, Masayoshi Itou, Masahisa Ito, Yoshiharu Sakurai, Ryutaro Yamaki, Hiroyuki Nishino
Rok vydání: 2010
Předmět:
Zdroj: Key Engineering Materials. 459:11-14
ISSN: 1662-9795
DOI: 10.4028/www.scientific.net/kem.459.11
Popis: We have measured magnetic Compton profile of Co/Pd thin films sputtered on a substrate for studying the electronic structure. For the first time, a silicon nitride substrate of 100 nm thickness we used in the magnetic Compton scattering experiment. We have improved vacuum tubes of the Compton beam-line BL08W of SPring-8, and have reduced greatly the background scattering for the Compton profile. We have succeeded in measuring magnetic Compton profile of Co (0.8 nm)/Pd (1.6 nm) 400 nm multilayer.
Databáze: OpenAIRE