Analysis of Channel Stress Induced by NiPt-silicide and Its Generation Mechanism

Autor:	M. Mizuo, Nobuyoshi Hattori, Tadashi Yamaguchi, Yukinori Hirose, H. Kimura, Junichi Tsuchimoto, Shuichi Kudo
Rok vydání:	2012
Předmět:	chemistry.chemical_compound Materials science chemistry business.industry Stress induced Silicide Optoelectronics business Mechanism (sociology) Communication channel
Zdroj:	Extended Abstracts of the 2012 International Conference on Solid State Devices and Materials.
DOI:	10.7567/ssdm.2012.d-2-2
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::826b2729963d9db68db3cbc9e518ad68 https://doi.org/10.7567/ssdm.2012.d-2-2 Zobrazit plný text záznamu