A model for the deposition of a-C:H using an expanding thermal arc
| Autor: | DC Daan Schram, E. Dekempeneer, M.C.M. van de Sanden, J.W.A.M. Gielen, Wilhelmus M. M. Kessels, L.J. van IJzendoorn |
|---|---|
| Rok vydání: | 1998 |
| Předmět: |
Materials science
Argon business.industry Analytical chemistry chemistry.chemical_element Surfaces and Interfaces General Chemistry Substrate (electronics) Condensed Matter Physics Surfaces Coatings and Films Amorphous solid chemistry.chemical_compound Optics Carbon film chemistry Acetylene Materials Chemistry Thin film business Carbon Deposition (chemistry) |
| Zdroj: | Surface and Coatings Technology. 98:1584-1589 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/s0257-8972(97)00358-7 |
| Popis: | Amorphous hydrogenated carbon films have been deposited at high growth rates (10–70 nm/s) by seeding acetylene in an expanding thermal argon plasma. The influence of the substrate temperature in the range of −50–300°C on the film properties, e.g. refractive index, hydrogen content and the growth rate, has been investigated. From this, in combination with earlier results, a first attempt at a qualitative deposition model is given. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect