Direct Patterning of Ionic Polymers with E-Beam Lithography
| Autor: | Stefan Jenisch, Steffen Strehle, Annina M. Steinbach, Parisa Bakhtiarpour, Masoud Amirkhani |
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| Rok vydání: | 2016 |
| Předmět: |
Materials science
Ionic bonding 02 engineering and technology Engraving 01 natural sciences chemistry.chemical_compound Nafion 0103 physical sciences Electron beam processing General Materials Science 010302 applied physics chemistry.chemical_classification business.industry Mechanical Engineering Polymer 021001 nanoscience & nanotechnology Condensed Matter Physics chemistry Resist Mechanics of Materials visual_art Electrode visual_art.visual_art_medium Optoelectronics 0210 nano-technology business Electron-beam lithography |
| Zdroj: | MRS Advances. 1:45-50 |
| ISSN: | 2059-8521 |
| DOI: | 10.1557/adv.2016.66 |
| Popis: | Controlling the bending properties of ionic polymer-metal composites may immediately affect their implementation in robotics and medicine. In the present work, we propose a direct patterning method for the ionic polymer Nafion using conventional electron-beam writing. In a proof-of-concept study, we show that patterns of arbitrary geometry and sizes between 1 µm and 50 µm can be engraved into the polymer surface without using resists. Pattern depth can be deliberately controlled by adjusting the exposure dose. The patterns were stable even after prolonged immersion in ionic solution. The presented technique therefore opens up the possibility to create unique electrode geometries and to investigate independently the effect of pattern size, density, depth as well as geometry on ionic polymer-metal composite bending. |
| Databáze: | OpenAIRE |
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