Introduction of helium into metals by magnetron sputtering deposition method

Autor: Shenggao Liu, Lian-Song Wang, Haoran Yu, Chao-Zhuo Liu, Hong Zheng, Liqun Shi
Rok vydání: 2005
Předmět:
Zdroj: Materials Letters. 59:1071-1075
ISSN: 0167-577X
Popis: High concentration helium, up to 16 at.%, was introduced into Ti films through magnetron sputtering method in a He/Ar complex atmosphere. The introduced helium distributes homogeneously in the films and mainly forms small helium bubbles. Helium thermodesorption experiments were carried out, from which it was found that the thermodesorption properties of the introduced 4 He are similar to those of radiogenic He-3 in titanium tritides. Titanium alloy films containing helium were also prepared through this way and a comparison of thermodesorption properties was made between them and Ti-He films. (C) 2004 Elsevier B.V. All rights reserved.
Databáze: OpenAIRE