New Yield-Impacting Polishing Induced Defects (PID) and A Method to Identify Them for Polished Si Substrates
Autor: | Hyo Sik Suh, Byeongsam Moon, KeunSu Kim, Jiae Kim, Sivakumar Venkat, Sanghyun Lee, William Shen, Yong Shin, Jonggeun Park, Jeonghoon An, Scott Seo, SungKi Park |
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Rok vydání: | 2008 |
Zdroj: | ECS Meeting Abstracts. :2012-2012 |
ISSN: | 2151-2043 |
Popis: | not Available. |
Databáze: | OpenAIRE |
Externí odkaz: |