New Yield-Impacting Polishing Induced Defects (PID) and A Method to Identify Them for Polished Si Substrates

Autor: Hyo Sik Suh, Byeongsam Moon, KeunSu Kim, Jiae Kim, Sivakumar Venkat, Sanghyun Lee, William Shen, Yong Shin, Jonggeun Park, Jeonghoon An, Scott Seo, SungKi Park
Rok vydání: 2008
Zdroj: ECS Meeting Abstracts. :2012-2012
ISSN: 2151-2043
Popis: not Available.
Databáze: OpenAIRE