Enhanced irradiation resistance of amorphous alloys by introducing amorphous/amorphous interfaces
| Autor: | Fei Wang, Wenbo Liu, Ke-Wei Xu, Z.Q. Chen, Tian Jian Lu, Ping Huang, Xiangkang Meng, Li-Ye Huang |
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| Rok vydání: | 2019 |
| Předmět: |
010302 applied physics
Materials science Amorphous metal Mechanical Engineering Metals and Alloys 02 engineering and technology General Chemistry 021001 nanoscience & nanotechnology Microstructure 01 natural sciences Amorphous solid Ion Chemical engineering Mechanics of Materials 0103 physical sciences Materials Chemistry Irradiation Thin film Solubility 0210 nano-technology |
| Zdroj: | Intermetallics. 107:39-46 |
| ISSN: | 0966-9795 |
| Popis: | To clarify the effect of amorphous/amorphous (A/A) interfaces during ion irradiation, the He ion irradiation responses of ZrCu/ZrCuNiAlSi A/A nanolaminates (A/ANLs) as well as ZrCu and ZrCuNiAlSi single-layered amorphous thin films were examined. The results showed the A/ANLs exhibited superior irradiation resistance compared with the corresponding single-layered thin films, as the former possessed better microstructure stability and higher He ion solubility than the latter during He ion irradiation. Besides, A/ANLs having more interfaces exhibited even better irradiation resistance than those having less. The enhanced irradiation resistance of A/ANLs was attributed to the sink effect of A/A interfaces, which effectively reduced the amount of radiation-induced “defects” and He bubbles. |
| Databáze: | OpenAIRE |
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