Atomic layer deposition of SnSex thin films using Sn(N(CH3)2)4 and Se(Si(CH3)3)2 with NH3 co-injection
| Autor: | Jeong Woo Jeon, Chanyoung Yoo, Woohyun Kim, Wonho Choi, Byongwoo Park, Yoon Kyeung Lee, Cheol Seong Hwang |
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| Rok vydání: | 2022 |
| Předmět: | |
| Zdroj: | Dalton Transactions. 51:594-601 |
| ISSN: | 1477-9234 1477-9226 |
| DOI: | 10.1039/d1dt03487a |
| Popis: | This study introduces the atomic layer deposition (ALD) of tin selenide thin films. By changing the growth temperature, the chemical composition of the Sn/Se ratio could be varied for the given precursor injection conditions. |
| Databáze: | OpenAIRE |
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