Adsorption and decomposition of methylsilanes on Si(100)

Autor:	Takehiro Maehama, Masanori Shinohara, Michio Niwano
Rok vydání:	2000
Předmět:	Infrared Hydride Thermal decomposition General Physics and Astronomy Infrared spectroscopy Surfaces and Interfaces General Chemistry Condensed Matter Physics Silane Surfaces Coatings and Films chemistry.chemical_compound Adsorption chemistry Desorption Physical chemistry Methylsilane
Zdroj:	Applied Surface Science. :161-167
ISSN:	0169-4332
DOI:	10.1016/s0169-4332(00)00186-0
Popis:	We have investigated in-situ the adsorption and thermal decomposition of methylsilanes, SiH x (CH 3 ) 4− x ( x =1–3), on Si(100)(2×1), using infrared absorption spectroscopy (IRAS) in the multiple internal reflection geometry. IRAS spectra revealed that at initial stages of adsorption, monohydride (–SiH) and CH 3 -substituted hydride species (–SiH x (CH 3 ) 3− x ) are generated with monohydride species being dominant. We suggest that upon room temperature adsorption of methylsilanes, breaking of the SiH bonds of methylsilane is favored over that of the SiC bonds. It is found that the dissociative adsorption of SiH 3 (CH 3 ) exhibits the second-order kinetics. Due to thermal annealing, surface species –SiH x (CH 3 ) 3− x are thermally decomposed to generate surface SiH and SiC bonds, and subsequently H 2 desorption from the SiH bonds occurs.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::810fd13479e1afb69634d86182b18708 https://doi.org/10.1016/s0169-4332(00)00186-0 Zobrazit plný text záznamu Full Text from ScienceDirect