LPCVD of Silicon Nitride from Dichlorosilane and Ammonia by Single Wafer Rapid Thermal Processing
| Autor: | Dana Teasdale, Yoshihide Senzaki, Phillip Schubert, Robert Herring, Gary Hoeye, Lawrence Page |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
Materials science
General Chemical Engineering Dichlorosilane Nanotechnology Chemical vapor deposition chemistry.chemical_compound Ammonia Silicon nitride chemistry Rapid thermal processing Electrochemistry General Materials Science Wafer Electrical and Electronic Engineering Physical and Theoretical Chemistry |
| Zdroj: | Electrochemical and Solid-State Letters. 4:F11 |
| ISSN: | 1099-0062 |
| DOI: | 10.1149/1.1359056 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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