Summary Abstract: Ion‐enhanced etching of Si and SiO2 by Cl2

Autor:	H. P. Gillis, W. J. Gignac
Rok vydání:	1986
Předmět:	Materials science Etching (microfabrication) business.industry Optoelectronics Surfaces and Interfaces Condensed Matter Physics business Surfaces Coatings and Films Ion
Zdroj:	Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. 4:696-697
ISSN:	1520-8559 0734-2101
DOI:	10.1116/1.573835
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::807b5dab70e4cc99a3ad88efc0dd8cac https://doi.org/10.1116/1.573835 Zobrazit plný text záznamu