Electron energy probability function measurement in a 2 MHz and 13.56 MHz dual-frequency capacitively coupled argon plasma
| Autor: | Young-Hun Hong, Tae-Woo Kim, Beom-Seok Kim, Moo-Young Lee, Chin-Wook Chung |
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| Rok vydání: | 2022 |
| Předmět: | |
| Zdroj: | Plasma Sources Science and Technology. 31:075008 |
| ISSN: | 1361-6595 0963-0252 |
| DOI: | 10.1088/1361-6595/ac7ee2 |
| Popis: | The effect of low-frequency power and high-frequency power on the electron energy probability function (EEPF) and the physical and electrical characteristics of plasma are experimentally investigated in a dual-frequency capacitively coupled plasma. RF powers of 2 MHz (low-frequency) and 13.56 MHz (high-frequency) are simultaneously applied to an electrode. EEPFs and DC self-bias voltages (V DC) are measured as one of the two RF powers is increased while the other is fixed. When the 2 MHz power increases at a fixed 13.56 MHz power, the electron density decreases, and the electron temperature increases with the decrease in the population of low-energy (below 5 V) electrons in the EEPF. Note that the increase in the low-frequency power is accompanied by a large decrease in V DC, which is related to the ion energy. On the other hand, when 13.56 MHz power increases at a fixed 2 MHz power, the electron density and the electron temperature significantly increase with the increase in the population of high-energy (above 5 V) electrons in the EEPF, while V DC decreases slightly. Experimental results show that the increase in the low-frequency power enhances the ion energy, and the increase in the high-frequency power enhances electron heating and ionization efficiency. |
| Databáze: | OpenAIRE |
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