Characterization of II-VI semiconductor materials using surface analytical techniques
Autor: | Martyn H. Kibel |
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Rok vydání: | 1990 |
Předmět: | |
Zdroj: | X-Ray Spectrometry. 19:73-77 |
ISSN: | 1097-4539 0049-8246 |
Popis: | The production, properties and structure of II–VI semiconductor materials are topics of increasingly intense research activity. This paper discusses the use of the surface analytical techniques x-ray photoelectron spectroscopy, Auger electron spectroscopy and energy-dispersive x-ray spectroscopy to study and characterize these materials, and hence assist in understanding the growth process. |
Databáze: | OpenAIRE |
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