Discharge and circuit simulation of a plasma cathode TEA HF laser operating with a He/SF6/C3H8 gas mixture

Autor:	Alexandros A. Serafetinides, G. N. Tsikrikas
Rok vydání:	1997
Předmět:	Materials science business.industry Plasma Laser Atomic and Molecular Physics and Optics Cathode Electronic Optical and Magnetic Materials Power (physics) law.invention Optics law Electrical and Electronic Engineering Physical and Theoretical Chemistry Current (fluid) business Voltage
Zdroj:	Optics Communications. 134:145-148
ISSN:	0030-4018
DOI:	10.1016/s0030-4018(96)00560-3
Popis:	A circuit and discharge simulation is presented for a TEA HF laser operating with a He/SF 6 /C 3 H 8 gas mixture. A comparison of the simulated discharge voltage, current, resistance and input power with the corresponding experimental results is presented together with a discussion on the factors affecting the simulation accuracy.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::7f466c42540a95c03e2b97070ae4664c https://doi.org/10.1016/s0030-4018(96)00560-3 Zobrazit plný text záznamu Full Text from ScienceDirect