A polishing method for single crystal diamond (100) plane based on nano silica and nano nickel powder
| Autor: | W.J. Zong, Guo Li, Cui Zhipeng |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Materials science
Polishing chemistry.chemical_element 02 engineering and technology engineering.material 010402 general chemistry 01 natural sciences Diamond cutting symbols.namesake Nano Materials Chemistry Surface roughness Electrical and Electronic Engineering Composite material Plane (geometry) Mechanical Engineering Diamond General Chemistry 021001 nanoscience & nanotechnology 0104 chemical sciences Electronic Optical and Magnetic Materials Nickel chemistry engineering symbols 0210 nano-technology Raman spectroscopy |
| Zdroj: | Diamond and Related Materials. 95:141-153 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/j.diamond.2019.04.016 |
| Popis: | Single crystal diamond is widely used in the manufacturing of diamond cutting tools. In this work, the diamond (100) plane which is always orientated as the rake face of diamond cutting tools is polished by using a polishing pad covered with nano silica and nickel powder. The results show that the polishing with nano nickel powder can achieved the satisfactory surface quality in a defined polishing time of 140 min, in which the surface roughness of the polished diamond (100) plane reaches to 0.25 nm Ra and 2.30 nm PV in a scanning area of 50 × 50 μm2. Raman spectra analysis further reveals that graphitization or amorphization occurs on the diamond surface during polishing with nickel powder. Finally, based on the polishing method with nano nickel powder, the influence of the polishing parameters on the achieved surface quality is investigated so as to optimize the polishing parameters. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Full Text from ScienceDirect