Structural behavior of direct-current sputtered and thermally evaporated molybdenum thin films
| Autor: | L. Binst, S Kacim, P. Delcambe, M. Jardinier-Offergeld, F. Bouillon |
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| Rok vydání: | 1994 |
| Předmět: |
Auger electron spectroscopy
Metals and Alloys Analytical chemistry chemistry.chemical_element Surfaces and Interfaces Crystal structure Chemical vapor deposition Nitride Surfaces Coatings and Films Electronic Optical and Magnetic Materials Crystallography chemistry Electron diffraction Molybdenum Materials Chemistry Crystallite Thin film |
| Zdroj: | Thin Solid Films. 249:150-154 |
| ISSN: | 0040-6090 |
| DOI: | 10.1016/0040-6090(94)90753-6 |
| Popis: | Mo films were deposited on sintered polycrystalline MgO. These films exhibited, depending on deposition conditions, two different structures, namely the normal body-centered cubic and an abnormal face-centered cubic. The analysis performed by electron diffraction and Auger electron spectroscopy indicated that the fcc structure assumed by molybdenum is an impurity-stabilized phase rather than a simple polymorphic transformation or dimolybdenum nitride (γMo2N) as previously stated by some authors. |
| Databáze: | OpenAIRE |
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