Photosensitivity and Contrast Determination of Photoresist by Laser Interferometry
Autor: | M. R. Hannifan, T. R. Pampalone, C. D. Krieger, S. Jain |
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Rok vydání: | 1984 |
Předmět: |
Materials science
Renewable Energy Sustainability and the Environment business.industry media_common.quotation_subject Photoresist Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Laser interferometry Interferometry Optics Photosensitivity Resist Materials Chemistry Electrochemistry Optoelectronics Contrast (vision) Thin film business Laser beams media_common |
Zdroj: | Journal of The Electrochemical Society. 131:2670-2674 |
ISSN: | 1945-7111 0013-4651 |
Databáze: | OpenAIRE |
Externí odkaz: |