Methods of nanostructured coatings deposition by magnetron sputtering and cathodic arc evaporation

Autor:	V. N. Pashentsev
Rok vydání:	2017
Předmět:	Materials science Ion beam Mechanical Engineering Metallurgy Surfaces and Interfaces Substrate (electronics) engineering.material Sputter deposition Evaporation (deposition) Electron beam physical vapor deposition Surfaces Coatings and Films Corrosion Coating Sputtering engineering
Zdroj:	International Journal of Surface Science and Engineering. 11:36
ISSN:	1749-7868 1749-785X
DOI:	10.1504/ijsurfse.2017.10003786
Popis:	Nanoscale coatings improve hardness, corrosion resistance and wear resistance of the cutting tools and machine parts. The sputtering magnetrons and the cathodic arc evaporators are used in industrial and medical applications to produce functional and protective films. PVD methods of nanostructured coating deposition based on limitation of crystal growth are described in this article. Three methods are applied for this purpose. Metal cathodes containing 3%-12% additives such as Si, B, BN, Cu, Ni are used to limit the crystal growth in the nanoscale range. The substrate rotation leads to the reduction of the layer thickness to obtain the multilayer nanoscale coatings. Bias voltage applied to the substrate holder for the ion bombardment and the substrate heating can be used to reduce the crystal size in the coating. The design of the vacuum set with plasma sources and ion beam source is considered.
Databáze:	OpenAIRE
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