Nano-scale Deformation of Resist Film Surface by Humidifying and Drying Processes
| Autor: | Akira Kawai, Takashi Yamaji, Masahito Hirano |
|---|---|
| Rok vydání: | 2008 |
| Předmět: |
chemistry.chemical_classification
Materials science Aggregate (composite) Polymers and Plastics Organic Chemistry Condensation Humidity Nanotechnology Polymer Deformation (meteorology) Condensed Matter::Soft Condensed Matter Adsorption chemistry Resist Materials Chemistry Composite material Nanoscopic scale |
| Zdroj: | Journal of Photopolymer Science and Technology. 21:737-738 |
| ISSN: | 1349-6336 0914-9244 |
| DOI: | 10.2494/photopolymer.21.737 |
| Popis: | Nano-scale deformation of resist film surface is analyzed by using atomic force microscope (AFM) in a humidity controlled chamber. It is clarified that the condensation size of polymer aggregates of resist material are slightly changed due to humidity change. As one major factor, Laplace force acting among polymer aggregate due to surface adsorbed water is discussed. The deformation model of condensed polymer aggregates is proposed. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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