Growth Conditions Effect on the Structure and Optical Properties of ZnO Thin Films Synthesized by rf magnetron Sputtering

Autor:	Luis Angelats-Silva, Maharaj S. Tomar, Sundiram P. Singh, Segundo R. Jáuregui-Rosas, Oscar Perales-Perez
Rok vydání:	2009
Předmět:	Materials science Band gap business.industry Sputtering RF power amplifier Transmittance Optoelectronics Thin film High-power impulse magnetron sputtering Sputter deposition business Grain size
Zdroj:	MRS Proceedings. 1165
ISSN:	1946-4274 0272-9172
Popis:	We report a systematic study of the influence of the target-substrate distance and rf power on the structural and optical properties of ZnO thin films grown by rf magnetron sputtering in Ar atmosphere from ZnO sputtering target. Sharp (002) peak showed by XRD indicates a c-axis crystalline growth of ZnO films. Growth rate remained almost constant for short target-substrate distances. However, the grain size increases with the rf power decreasing the compressive stress in ZnO films. As-grown ZnO films have average transmittance more than 80% in the visible region. Optical bandgap (Eg) increases from 3.18 to 3.27 eV as increase the target-substrate distance probably due to low stress compression in ZnO films. In addition, when rf power is above 100 W, the optical band gap increases as increase of the stress compression.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::7d4291a6d84dc079ea860216cf4c7be2 https://doi.org/10.1557/proc-1165-m08-38 Zobrazit plný text záznamu Full text from SpringerLink