A practical MOCVD approach to the growth of Pr1-xCaxMnO3films on single crystal substrates
| Autor: | Guglielmo G. Condorelli, Maria R. Catalano, Graziella Malandrino, Roberta G. Toro, Raffaella Lo Nigro, Emanuela Schilirò |
|---|---|
| Rok vydání: | 2015 |
| Předmět: |
Materials science
Nanotechnology Surfaces and Interfaces Substrate (electronics) Chemical vapor deposition Combustion chemical vapor deposition Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Field emission microscopy Chemical engineering Materials Chemistry Deposition (phase transition) Metalorganic vapour phase epitaxy Electrical and Electronic Engineering Thin film Single crystal |
| Zdroj: | physica status solidi (a). 212:1550-1555 |
| ISSN: | 1862-6300 |
| DOI: | 10.1002/pssa.201532363 |
| Popis: | Pr1–xCaxMnO3 thin films have been deposited through an in situ metal organic chemical vapor deposition (MOCVD) process using a molten multi-metal source, consisting of the Pr(hfa)3·diglyme, Ca(hfa)2·tetraglyme, and Mn(tmhd)3 precursor mixture on single crystal substrates such as LaAlO3 (001) and MgO (001). Optimization of processing parameters has allowed the deposition of homogeneous thin films in morphology, composition, and thickness. The effect of substrate has been assessed in relation to structure and morphology. Field emission scanning electron microscope of a Pr0.7Ca0.3MnO3 film deposited at 1000 °C on MgO (001). |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Plný text