Passivation of aluminum with alkyl phosphonic acids for biochip applications
| Autor: | Sachin Attavar, Mohit Diwekar, Steve Blair, Matthew R. Linford, Mark Alan Davis |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
inorganic chemicals
chemistry.chemical_classification Materials science Passivation Inorganic chemistry General Physics and Astronomy chemistry.chemical_element Surfaces and Interfaces General Chemistry Condensed Matter Physics complex mixtures Surfaces Coatings and Films chemistry.chemical_compound chemistry X-ray photoelectron spectroscopy Aluminium Silanization Self-assembly Wetting Alkyl Octadecylphosphonic acid |
| Zdroj: | Applied Surface Science. 256:7146-7150 |
| ISSN: | 0169-4332 |
| DOI: | 10.1016/j.apsusc.2010.05.041 |
| Popis: | Self-assembly of decylphosphonic acid (DPA) and octadecylphosphonic acid (ODPA) was studied on aluminum films using XPS, ToF-SIMS and surface wettability. Modified aluminum films were tested for passivation against silanization and subsequent oligonucleotide attachment. Passivation ratios of at least 450:1 compared to unprotected aluminum were obtained, as quantified by attachment of radio-labeled oligos. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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