TID Effect of MOSFETs in SOI BCD Process and its Hardening Technique

Autor:	Shiping Wang, Xiaojing Li, Xiaowu Cai, Duoli Li, Meichen Jin, Peng Lu, Huiping Zhu, Chuanbin Zeng, Yun Tang, Ruirui Xia, Lei Wang, Bo Li
Rok vydání:	2023
Předmět:	Nuclear and High Energy Physics Nuclear Energy and Engineering Electrical and Electronic Engineering
Zdroj:	IEEE Transactions on Nuclear Science. :1-1
ISSN:	1558-1578 0018-9499
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::7cfc0d9011e5284060d4e0e92af6be14 https://doi.org/10.1109/tns.2023.3281597 Zobrazit plný text záznamu