Chemically amplified resist process for 0.25-um-generation photomasks
| Autor: | Mikio Katsumata, Hiroichi Kawahira, Minoru Sugawara, Satoru Nozawa |
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| Rok vydání: | 1996 |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.262795 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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