Autor: |
Takeshi Yasuda, Tomohiro Kobayashi, Isao Nakamura, Kazuo Morikawa, Atsushi Mitsuo, Yoshikazu Teranishi, Masanori Ishizuka, Takahiko Uematu |
Rok vydání: |
2012 |
Předmět: |
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Zdroj: |
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 272:458-461 |
ISSN: |
0168-583X |
Popis: |
Application of nano and micro fabrication techniques in industry requires solution to some crucial problems. One of the significant problems is the sticking interface between mold surface and imprinted polymer. In this study, we report a solution to the sticking interface problem by modification of nano imprinting mold using fluorine ion implantation. After the fluorine implantation, anti sticking layer appeared on the nano imprinting mold surface. After the implantation, a mold made from glass like carbon was patterned by focused ion beam lithography. The pattern was made up of word “TIRI”. The line width was varied with 300 nm, 500 nm, and 1 μm. The line depth was about 200 ∼ 300 nm. The average depth of implanted fluorine was approximately 90 nm. After imprinting, the resin was removed from the mold by mechanical lift-off process. Transferred pattern was observed and confirmed by a scanning electron microscope (SEM) and an atomic force microscope (AFM). The pattern transferred from mold to resin was found to be successful. |
Databáze: |
OpenAIRE |
Externí odkaz: |
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