Phase-shifting technology of digital lateral shearing interferometer

Autor: 向阳 Xiang Yang, 何煦 He Xu
Rok vydání: 2013
Předmět:
Zdroj: Optics and Precision Engineering. 21:2244-2251
ISSN: 1004-924X
Popis: As the resolution,accuracy and other parameters of the phase-shifting unit in a phase-shifting lateral shearing interferometer will directly affect the test accuracy of wavefront aberration for a lithograph objective,a phase-shifting component with macro and micro compound motion modes was designed based on the principle of phase-shifting test for wavefront aberration.It could achieve a phase-shifting resolution of 3 nm in a 25 mm travel range.Moreover,the mathematical relation of initial parameters was analyzed for the micro unit with a flexure hinge composited four linkage structure.The stiffness and weak interfacial stress of the flexure hinge were calculated,and a design example was given.The finite element analysis method was used to simulate the relation between phase-shifting value and the output of piezoelectric ceramic(PZT) and to analyze the phase-shifting accuracy.The results show that the PZT can actuate one-dimensional phase-shifting motion in 0.1 mm-1 nm within its output range,and the theoretical accuracy is better than 3.5 nm.The openloop calibration test shows that the actual accuracy of micro-motion unit in the phase-shifting component is better than 5 nm.
Databáze: OpenAIRE