Optimization of low-temperature poly-Si TFT-LCDs and a large-scale production line for large glass substrates
| Autor: | Shiro Nakanishi, Kohji Suzuki, Yoshihiro Morimoto, Kiyoshi Yoneda, Hidenori Ogata, Tsutomu Yamada, Shinji Yuda, Toshifumi Yamaji |
|---|---|
| Rok vydání: | 2001 |
| Předmět: |
Production line
Liquid-crystal display Materials science Excimer laser business.industry medicine.medical_treatment Chemical vapor deposition Atomic and Molecular Physics and Optics Electronic Optical and Magnetic Materials law.invention Thin-film transistor law Plasma-enhanced chemical vapor deposition medicine Optoelectronics Electrical and Electronic Engineering Stepper Photolithography business |
| Zdroj: | Journal of the Society for Information Display. 9:173-180 |
| ISSN: | 1071-0922 |
| DOI: | 10.1889/1.1828785 |
| Popis: | An update of the progress of inherently low-temperature poly-Si (LTPS) technologies, such as ELA, ion doping, and activation in conjunction with chemical vapor deposition (CVD) and pho. tolithography will be given. We will also discuss whether LTPS LCDs will be applied to a large-scale production line using a large motherglass substrate. It was found that a more-powerful excimer laser as well as photolithography with higher-resolution and a more-precise overlaid arrangement woulc enable a large-scale production line handling motherglass of 4th generation size to be constructed ir the very near future with reasonable investment and productivity costs. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Plný text