The effect of different etching modes on the smoothing of the rough surfaces
| Autor: | M. Radmilović-Radjenović, B. Radjenović |
|---|---|
| Rok vydání: | 2012 |
| Předmět: |
010302 applied physics
Materials science Condensed matter physics Physics::Instrumentation and Detectors business.industry Mechanical Engineering Isotropy 02 engineering and technology Surface finish 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences Isotropic etching Computer Science::Other Optics Mechanics of Materials Etching (microfabrication) Sputtering 0103 physical sciences Surface roughness General Materials Science 0210 nano-technology Anisotropy business Smoothing |
| Zdroj: | Materials Letters. 86:165-167 |
| ISSN: | 0167-577X |
| DOI: | 10.1016/j.matlet.2012.07.068 |
| Popis: | This letter presents a study on the influence of the three different etching modes (isotropic, anisotropic and sputtering) on the dynamics of smoothing of roughed surfaces. Calculations were performed using a three-dimensional simulation package based on the level set method. The obtained simulation results clearly show that the surface roughness could be reduced by both the sputtering and the isotropic etching, although the sputtering process is much more efficient. On the other hand, it is shown that the anisotropic etching is not an effective mechanism of smoothing. The time dependence of the interface width is analyzed and growth exponent β has been determined for all etching modes. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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