P-4: Fabrication of Extremely Low Roughness Polycrystalline Silicon and Its Correlation to Device Performance

Autor:	Jia-Xing Lin, Yung-Fu Wu, Yu‐Rung Liu, Shang‐Wen Chang, Yu-Cheng Chen, Chai-Yuan Sheu, Jung‐Fang Chang, Yung-Hui Yeh, Chi-Lin Chen
Rok vydání:	2003
Předmět:	Fabrication Materials science business.industry Hybrid silicon laser Nanocrystalline silicon Surface finish engineering.material Polycrystalline silicon Etching (microfabrication) Chemical-mechanical planarization engineering Electronic engineering Optoelectronics business Smoothing
Zdroj:	SID Symposium Digest of Technical Papers. 34:216
ISSN:	0097-966X
DOI:	10.1889/1.1832241
Popis:	The process of smoothing polycrystalline silicon surface has been investigated. By etching the precursor and controlling the laser annealing, The roughness of poly-Si can be planarized to a very low level RMS
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::7be9b55c98db1667e747722898e4f772 https://doi.org/10.1889/1.1832241 Zobrazit plný text záznamu Plný text